AQ 3000 is a liquid photoimageable photoresist designed to eliminate VOCs and harmful solvents from the photoresist process. It is a completely waterborne product, which can be used in the standard photoresist coating process.

The advanced chemistry provides properties expected in a world class LPR. AQ 3000 is completely water-reducible to meet specific viscosity requirements.

The Advantages are Crystal Clear

• Waterborne
• VOC Free 
  
• One Part 
  
• Short Exposure Times    
  
• Laser Direct Imageable 
  
• Superior Resolution 
  
• 43% Solids      
  
• Soap and Water Clean Up

AQ 2000 is a liquid photoimageable soldermask designed to eliminate VOCs and harmful solvents from the photoresist process. It is a completely waterborne product, which can be used in the standard soldermask coating process.

The advanced chemistry produces superior electrical, chemical and physical properties expected in a world class LPSM. AQ 2000 is available in several versions for various application methods. AQ 2000 is completely water-reducible to meet specific viscosity requirements.

The Advantages are Crystal Clear 

• Waterborne
• VOC Free 
  
• Two Part  System
  
• Short Exposure Times 
• Superior Resolution 
  
• 55% Solids      
  
• Soap and Water Clean Up

AQ 2100 is a liquid photoimageable legend ink designed to eliminate VOCs and harmful solvents from the legend ink process. It is a completely waterborne product which can be used in all standard LPI  processes.

The advanced chemistry produces superior electrical, chemical and physical properties expected in a world class LPI. AQ 2100 is available in several versions for various application methods. It is completely water-reducible to meet specific viscosity requirements.

The Advantages are Crystal Clear 

• Waterborne
• VOC Free 
  
• Two Part  System
  
• Short Exposure Times 
• Superior Resolution 
  
• 50% Solids      
  
• Soap and Water Clean Up